Penetration of corrosive species into copper exposed to simulated O2-free groundwater by time-of-flight secondary ion mass spectrometry (ToF-SIMS)
Xiaoqi Yue, Per Malmberg, Elisa Isotahdon, Vilma Ratia, Elina Huttunen‐Saarivirta, Christofer Leygraf, Jinshan Pan
Abstract
ToF-SIMS analysis of copper samples after exposures to simulated groundwater with and without sulfide addition was performed to investigate the penetration of corrosive species containing H, S, O, and Cl, into copper. Depth profiles show extent of penetration and 2D/3D images reveal local elemental distribution of the corrosive species at different depths inside copper. Pre-oxidation did not reduce the penetration while sulfide additional in groundwater and exposure at 60 °C significantly promoted the penetration. The extent of penetration of the corrosive species into copper demonstrates the need for risk assessment of complex corrosion forms such as sulfide-induced embrittlement and cracking.