Quantitative study of oxidation mechanism in photoelectrochemical mechanical polishing of difficult-to-process semiconductor wafers
Yuewen Sun, Shang Gao, Bi Zhang, Yang Zhao, Xiaoguang Guo, Renke Kang, Zhigang Dong
Topics & Concepts
PolishingWaferSemiconductorMechanism (biology)Process (computing)Materials scienceChemical-mechanical planarizationPhotoelectrochemistryOxidation processOptoelectronicsMetallurgyComputer scienceElectrochemistryChemistryChemical engineeringEngineeringPhysicsPhysical chemistryElectrodeQuantum mechanicsOperating systemAdvanced Surface Polishing TechniquesIntegrated Circuits and Semiconductor Failure AnalysisElectron and X-Ray Spectroscopy Techniques