In-process Synthesis of a Ag/AgCl/g-C<sub>3</sub>N<sub>4</sub> Ternary Heterojunction Photocatalysts for Plasmon Resonance Enhanced Polishing
Songhua Wu, Qi Sun, Di Wu, Bingchun Jia, Yuelong Li, Zongbao Zhen, Bing‐Feng Ju, Tianchen Zhao, Yikai Li, Wu-Le Zhu
Abstract
Surface plasmon resonance has been generally employed to enhance the photoresponse in typical fields such as energy conversion and chemical sensing. In this study, we propose a plasmon resonance enhanced polishing (PREP) method based on in-process synthesized Ag/AgCl/g-C 3 N 4 ternary heterojunctions, which overcomes three critical bottlenecks in conventional photochemical mechanical polishing including complex ex-process synthesis protocols, short-wavelength-limited photoresponse, and rapid charge carrier recombination. By synergistically integrating localized surface plasmon resonance (LSPR) from Ag nanoparticles with a Z-scheme charge transfer mechanism in the AgCl/g-C 3 N 4 heterojunction, we achieve an expanded light absorption range up to 625 nm and significantly improve the separation efficiency of photogenerated carriers. Experimental results demonstrate that the in-process synthesized heterojunction photocatalysts facilitate a 3.02-fold increase in material removal rate under broad-spectrum solar illumination while maintaining close-to-atomic-level surface roughness (0.37 nm). This work not only provides fundamental insights into the dynamic construction of heterojunction architectures but also opens up new application scenarios of the heterojunction-based plasmon resonance phenomenon.