Stability of iron chelates during photo-Fenton process: The role of pH, hydroxyl radical attack and temperature
Ungwanen J. Ahile, R. A. Wuana, A. U. Itodo, Rufus Sha’Ato, Renato F. Dantas
Topics & Concepts
ChemistryEndothermic processChelationKineticsReaction rate constantRadicalInorganic chemistryHydroxyl radicalDegradation (telecommunications)Nuclear chemistryOrganic chemistryQuantum mechanicsPhysicsAdsorptionTelecommunicationsComputer scienceAdvanced oxidation water treatmentIron oxide chemistry and applicationsElectrochemical Analysis and Applications