Rapid aberration correction for diffractive X-ray optics by additive manufacturing
Frank Seiboth, Adam Kubec, Andreas Schropp, Sven Niese, Peter Gawlitza, Jan Garrevoet, Vanessa Galbierz, Silvio Achilles, Svenja Patjens, Michael Stückelberger, Christian Dávid, Christian G. Schroer
Abstract
Diffraction-limited hard X-ray optics are key components for high-resolution microscopy, in particular for upcoming synchrotron radiation sources with ultra-low emittance. Diffractive optics like multilayer Laue lenses (MLL) have the potential to reach unprecedented numerical apertures ( NA ) when used in a crossed geometry of two one-dimensionally focusing lenses. However, minuscule fluctuations in the manufacturing process and technical limitations for high NA X-ray lenses can prevent a diffraction-limited performance. We present a method to overcome these challenges with a tailor-made refractive phase plate. With at-wavelength metrology and a rapid prototyping approach we demonstrate aberration correction for a crossed pair of MLL, improving the Strehl ratio from 0.41(2) to 0.81(4) at a numerical aperture of 3.3 × 10 −3 . This highly adaptable aberration-correction scheme provides an important tool for diffraction-limited hard X-ray focusing.