Influence of co-reactants on surface passivation by nanoscale hafnium oxide layers grown by atomic layer deposition on silicon
Sophie L. Pain, Edris Khorani, Anup Yadav, Tim Niewelt, A. Leimenstoll, Brendan F. M. Healy, Marc Walker, David Walker, Nicholas E. Grant, John D. Murphy
Abstract
Hafnium oxide thin films have attracted considerable interest for passivation layers, protective barriers, and anti-reflection coatings. This study presents a systematic investigation into the role of film growth co-reactant on film properties.
Topics & Concepts
PassivationMaterials scienceHafniumAtomic layer depositionLayer (electronics)SiliconNanoscopic scaleDeposition (geology)OxideReflection (computer programming)Thin filmOptoelectronicsChemical engineeringNanotechnologyMetallurgyZirconiumEngineeringBiologyPaleontologySedimentProgramming languageComputer scienceSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignIntegrated Circuits and Semiconductor Failure Analysis