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Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect

Wantang Wang, Baoguo Zhang, Yunhui Shi, Jiakai Zhou, Ru Wang, Nengyuan Zeng

2021Applied Surface Science105 citationsDOI

Topics & Concepts

Chemical-mechanical planarizationMaterials sciencePolishingSlurryAbrasiveSilicon carbideSurface roughnessPhotocatalysisChemical engineeringComposite materialCatalysisChemistryBiochemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis
Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect | Litcius