Large-Scale Metasurfaces Made by an Exposed Resist
Daniel Andrén, Jade Martínez-Llinàs, Philippe Tassin, Mikael Käll, Ruggero Verre
Abstract
Phase-gradient metasurfaces have the potential to revolutionize photonics by offering ultrathin alternatives to a wide range of common optical elements, including bulky refractive optics, waveplates, and axicons. However, the fabrication of state-of-the-art metasurfaces typically involves several expensive, time-consuming, and potentially hazardous processing steps. To address this limitation, a facile methodology to construct phase-gradient metasurfaces from an exposed standard electron beam resist is developed. The method dramatically cuts the required processing time and cost as well as reduces safety hazards. The advantages of the method are demonstrated by constructing high-performance flat optics based on the Pancharatnam-Berry phase gradient concept for the entire visible wavelength range. Manufactured devices include macroscopic (1 cm diameter) positive lenses, gratings exhibiting anomalous reflection, and cylindrical metalenses on flexible plastic substrates.