An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching
Zhidong Fang, Yi Zhang, Rulin Li, Yanan Liang, Hui Deng
Topics & Concepts
PolishingWaferDangling bondEtching (microfabrication)Materials scienceChemical-mechanical planarizationFlatness (cosmology)Single crystalPlasmaSurface roughnessCrystal (programming language)Plasma etchingSiliconAnalytical Chemistry (journal)CrystallographyOptoelectronicsNanotechnologyChemistryComposite materialLayer (electronics)Programming languageChromatographyQuantum mechanicsComputer scienceCosmologyPhysicsAdvanced Surface Polishing TechniquesSemiconductor materials and devicesDiamond and Carbon-based Materials Research