Machine-learning-enabled geometric compliance improvement in two-photon lithography without hardware modifications
Yuhang Yang, Varun A. Kelkar, Hemangg S. Rajput, Adriana C. Salazar Coariti, Kimani C. Toussaint, Chenhui Shao
Topics & Concepts
Microscale chemistryLithographyMaterials scienceProcess (computing)Compensation (psychology)Nanoscopic scaleComputer scienceNanotechnologyArtificial intelligenceOptoelectronicsMathematicsOperating systemPsychoanalysisPsychologyMathematics educationNonlinear Optical Materials StudiesForce Microscopy Techniques and ApplicationsNanofabrication and Lithography Techniques