Safer and effective alternatives to perfluoroalkyl-based surfactants in etching solutions for the semiconductor industry
Rashmi Sharma, Shreyas Shelke, Mohammad Bagheri Kashani, Gregory Morose, Christopher Christuk, Ramaswamy Nagarajan
Topics & Concepts
Pulmonary surfactantContact angleChemistryWettingAmmonium fluorideAqueous solutionChemical engineeringInorganic chemistryMaterials scienceOrganic chemistryEngineeringBiochemistryPer- and polyfluoroalkyl substances researchCarbon Dioxide Capture TechnologiesSurface Modification and Superhydrophobicity