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A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(<scp>ii</scp>) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine

Anton Vihervaara, Timo Hatanpää, Kenichiro Mizohata, Mykhailo Chundak, Georgi Popov, Mikko Ritala

2022Dalton Transactions22 citationsDOIOpen Access PDF

Abstract

DHP can open new avenues for the ALD of other metals at low temperatures.

Topics & Concepts

NickelThermalChemistryChemical engineeringProcess (computing)Materials scienceNuclear chemistryOrganic chemistryThermodynamicsPhysicsComputer scienceEngineeringOperating systemSemiconductor materials and devicesPhase-change materials and chalcogenidesMetallic Glasses and Amorphous Alloys
A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(<scp>ii</scp>) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine | Litcius