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Influence of nitrogen flow ratio on properties of c-axis oriented AlN films grown by RF magnetron sputtering

Guifeng Chen, Haoran Li, Xinjian Xie, Luxiao Xie, Endong Wang, Guodong Liu, Hui Zhang, Bowen Lu, Changxing Li, Haobo Pei

2021Applied Physics A12 citationsDOI

Topics & Concepts

DiffractometerX-ray photoelectron spectroscopyMaterials scienceScanning electron microscopeAnalytical Chemistry (journal)SputteringSapphireSputter depositionNitrideTransmission electron microscopyCavity magnetronPhotoluminescenceArgonSurface roughnessThin filmLayer (electronics)OpticsOptoelectronicsChemistryComposite materialNanotechnologyNuclear magnetic resonanceLaserChromatographyPhysicsOrganic chemistryGaN-based semiconductor devices and materialsAcoustic Wave Resonator TechnologiesZnO doping and properties
Influence of nitrogen flow ratio on properties of c-axis oriented AlN films grown by RF magnetron sputtering | Litcius