Enhancing performance of Ti-Zn-oxo clusters for advanced lithography: effect of vertical ionization potential on sensitivity
Daohan Wang, Xiao‐Feng Gong, Runfeng Xu, Min Zhang, Danhong Zhou, Jiangli Fan, Jianjun Du, Jun Zhao, Jianhua Zhang, Pengzhong Chen, Xiaojun Peng
Topics & Concepts
LithographySensitivity (control systems)IonizationMaterials scienceNanotechnologyOptoelectronicsChemistryElectronic engineeringIonEngineeringOrganic chemistryAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesNanofabrication and Lithography Techniques