Composition and properties of RF-sputter deposited titanium dioxide thin films
Jesse Daughtry, Abdulrahman S. Alotabi, Liam Howard‐Fabretto, Gunther G. Andersson
Abstract
A simple, low-cost method of preparing photocatalytic TiO<sub>2</sub> thin films using RF plasma has been developed, offering known elemental composition, homogenous depositions, and easily modifiable crystallinity and surface properties.
Topics & Concepts
CrystallinityTitanium dioxideMaterials scienceThin filmSputteringTitaniumPhotocatalysisChemical engineeringComposition (language)Sputter depositionAnalytical Chemistry (journal)OptoelectronicsNanotechnologyMetallurgyComposite materialEnvironmental chemistryChemistryCatalysisBiochemistryLinguisticsPhilosophyEngineeringAdvanced Photocatalysis TechniquesCatalytic Processes in Materials ScienceGas Sensing Nanomaterials and Sensors