Selective Wet Etching for Scalable Nanofabrication of Patterned MXene Thin Films
Bar Favelukis, Barak Ratzker, Yonatan Juhl, Noy Stein Chneider, Omer Ashuach, Avia Greenberg, Jürgen Jopp, Pini Shekhter, Maxim Sokol
Abstract
High Resolution Image Download MS PowerPoint Slide The integration of MXenes, a class of conductive two-dimensional materials, into the microelectronics industry is largely hindered by the lack of scalable patterning methods. Herein, we present a novel wet etching approach for Ti 3 C 2 T z MXene micropatterning, offering a facile, clean, cost-effective, and highly controllable technique that preserves the MXene intrinsic electrical and structural properties. By tailoring the etching solution and process parameters, micropatterned MXene electrodes with ∼200 nm lateral resolution were produced. The patterned films were applied to functional devices, including metal–semiconductor−metal (MSM) photodetectors, which demonstrated high conductivity and enhanced photoresponsivity. This work represents the first demonstration of wet etching as a viable method for highly precise MXene patterning, providing a scalable solution for next-generation MXene-based microelectronic technologies.