Litcius/Paper detail

Surface cleaning process for plasma-etched SiC wafer

Lihuan Zhao, Haiping Shang, Dahai Wang, Yang Liu, Miao Xue, Jiahan Yu, Weibing Wang

2020Applied Physics A13 citationsDOI

Topics & Concepts

WaferPlasmaMaterials scienceProcess (computing)Plasma etchingPlasma cleaningOptoelectronicsEtching (microfabrication)NanotechnologyComputer scienceLayer (electronics)PhysicsNuclear physicsOperating systemAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis
Surface cleaning process for plasma-etched SiC wafer | Litcius