A Theoretical Study of the Oxygen Release Mechanisms of a Cu-Based Oxygen Carrier during Chemical Looping with Oxygen Uncoupling
Minjun Wang, Shixiong Zhang, Ming Xia, Mengke Wang
Abstract
The Cu-based oxygen carrier is a promising material in the chemical looping with oxygen uncoupling (CLOU) process, while its performance in the CLOU is significantly dependent on the oxygen release properties. However, the study of oxygen release mechanisms in CLOU is not comprehensive enough. In this work, the detailed oxygen release mechanisms of CuO(110) and CuO(111) are researched at an atomic level using the density functional theory (DFT) method, including the formation of O2, the desorption of O2 and the diffusion of O anion, as well as the analysis of the density of states. The results show that (1) the most favorable pathway for O2 formation and desorption occurs on the CuO(110) surface of O-terminated with energy barriers of 1.89 eV and 3.22 eV, respectively; (2) the most favorable pathway for O anion diffusion occurs in the CuO(110) slab with the lowest energy barrier of 0.24 eV; and (3) the total density of states for the O atoms in the CuO(110) slab shifts to a lower energy after an O vacancy formation. All of the above results clearly demonstrate that the CuO(110) surface plays a significantly important role in the oxygen release reaction, and the oxygen vacancy defect should be conducive to the reactivity of oxygen release in a Cu-based oxygen carrier.