UV and VUV-induced fragmentation of tin-oxo cage ions
Jarich Haitjema, Lianjia Wu, Alexandre Giuliani, Laurent Nahon, Sonia Castellanos, Albert M. Brouwer
Abstract
in terms of reaction products per absorbed photon. A possible explanation for this is proposed, which involves the counterion reacting with the initially formed tin-based radical.
Topics & Concepts
TinChemistryPhotoionizationPhotochemistryExtreme ultraviolet lithographyIonTrifluoromethanesulfonateCounterionFragmentation (computing)PhotoexcitationIonizationExcited stateMaterials scienceAtomic physicsNanotechnologyOrganic chemistryComputer sciencePhysicsOperating systemCatalysisAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesMass Spectrometry Techniques and Applications