Patterning edge-like defects and tuning defective areas on the basal plane of ultra-large MoS<sub>2</sub> monolayers toward the hydrogen evolution reaction
Bianca Rocha Florindo, Leonardo H. Hasimoto, Nicolli de Freitas, Graziâni Candiotto, Erika N. Lima, Cláudia de Lourenço, Ana B. S. de Araújo, Carlos Ospina, Jefferson Bettini, Edson R. Leite, Renato S. Lima, A. Fazzio, Rodrigo B. Capaz, Murilo Santhiago
Abstract
Supported and free-standing MoS 2 monolayers were patterned using a focused ion beam to tune their electrocatalytic activity toward H 2 production. Defects can either be confined near the etched interfaces or spread depending on the applied dose.
Topics & Concepts
MonolayerMaterials scienceEnhanced Data Rates for GSM EvolutionBasal planeOptoelectronicsHydrogenNanotechnologyCrystallographyChemistryComputer scienceTelecommunicationsOrganic chemistry2D Materials and ApplicationsElectrocatalysts for Energy ConversionMXene and MAX Phase Materials