Plasma CVD of B–C–N thin films using triethylboron in argon–nitrogen plasma
Laurent Souqui, Justinas Pališaitis, Hans Högberg, Henrik Pedersen
Abstract
We describe how chemical vapor deposition in the B–C–N material system can be done from triethylboron and a nitrogen–argon plasma. The films can be tuned to various morphologies and dielectric constants.
Topics & Concepts
ArgonMaterials scienceNitrogenPlasmaChemical vapor depositionPlasma-enhanced chemical vapor depositionDielectricAnalytical Chemistry (journal)Thin filmDeposition (geology)Chemical engineeringNanotechnologyOptoelectronicsOrganic chemistryChemistryEngineeringSedimentQuantum mechanicsPhysicsPaleontologyBiologyMetal and Thin Film MechanicsSemiconductor materials and devicesDiamond and Carbon-based Materials Research