Study on the affecting factors of material removal mechanism and damage behavior of shear rheological polishing of single crystal silicon carbide
Hongyu Chen, Zhengchao Wu, Binbin Hong, Wei Hang, Peng Zhang, Xingzhong Cao, Qiu Xu, Pengqi Chen, Heng Chen, Julong Yuan, Binghai Lyu, Hua‐Tay Lin
Topics & Concepts
PolishingMaterials scienceAbrasiveSilicon carbideSurface roughnessComposite materialScanning electron microscopeWaferSurface finishTransmission electron microscopyNanotechnologyAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchSilicon Carbide Semiconductor Technologies