Characterization and electrochemical behavior of a multilayer-structured Ti–N layer produced by plasma nitriding of electron beam melting TC4 alloy in Hank's solution
Yang Li, Zhengwei Wang, Minghao Shao, Zhehao Zhang, Chengxu Wang, Jiwen Yan, Junyang Lu, Lei Zhang, Bing Xie, Yongyong He, Jianxun Qiu
Topics & Concepts
NitridingMaterials scienceMicrostructureX-ray photoelectron spectroscopyScanning electron microscopeNanoindenterTinTitanium alloyCorrosionMetallurgyTitaniumAlloyTransmission electron microscopyElectron diffractionDielectric spectroscopyLayer (electronics)Chemical engineeringComposite materialElectrochemistryNanoindentationDiffractionNanotechnologyChemistryOpticsElectrodeEngineeringPhysical chemistryPhysicsMetal and Thin Film MechanicsTitanium Alloys Microstructure and PropertiesHigh Entropy Alloys Studies