Resistive switching in atomic layer deposited HfO2/ZrO2 nanolayer stacks
Lin Tang, Hiraku Maruyama, Taihao Han, Juan C. Nino, Yonghong Chen, Dou Zhang
Topics & Concepts
HafniaMaterials scienceAtomic layer depositionX-ray photoelectron spectroscopyResistive random-access memoryCubic zirconiaMonoclinic crystal systemSuboxideOptoelectronicsAmorphous solidOrthorhombic crystal systemNanotechnologyLayer (electronics)Crystal structureElectrodeChemical engineeringCrystallographySiliconComposite materialCeramicChemistryEngineeringPhysical chemistryAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesElectronic and Structural Properties of Oxides