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Extending Channel Scaling Limit of p-MOSFETs Through Antimonene With Heavy Effective Mass and High Density of State

Shengli Zhang, Hengze Qu, Jiang Cao, Yangyang Wang, Shengyuan A. Yang, Wenhan Zhou, Haibo Zeng

2022IEEE Transactions on Electron Devices25 citationsDOI

Abstract

Conventional silicon-based transistor downscaling is approaching its physical limits, and thus additional novel solutions are urgently desired to address this issue. Herein, we show that 2-D antimonene with heavy effective mass and high density of state (DOS) via strain engineering presents reliable transistor performance with the channel length ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {ch}}$ </tex-math></inline-formula> ) shrinking below 5 nm. As the biaxial tensile strain increases to 7%, the band switching gives rise to a heavy hole effective mass of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$12.6{m}_{{0}}$ </tex-math></inline-formula> and a Van Hoff singularity-like DOS. This unique electronic structure can effectively suppress the tunneling current, resulting in steep subthreshold swings (SSs) and ideal ON-current ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{ \mathrm{ON}}$ </tex-math></inline-formula> ). Especially, as <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {ch}}$ </tex-math></inline-formula> downscales to 2.2 nm, the OFF-current can be easily reduced to 0.1 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu \text{A}/\mu \text{m}$ </tex-math></inline-formula> with SS of 120 mV/dec (310 mV/dec for pristine antimonene) and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{ \mathrm{ON}}$ </tex-math></inline-formula> exceeds 900 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu \text{A}/\mu \text{m}$ </tex-math></inline-formula> , fulfilling the requirements for high-performance applications. Our results provide new insights on extending the scaling limit in energy-efficient gate-controlled devices.

Topics & Concepts

Topology (electrical circuits)PhysicsElectrical engineeringAlgorithmMathematicsCombinatoricsEngineeringFerroelectric and Negative Capacitance Devices2D Materials and ApplicationsSemiconductor materials and devices
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