Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography
Yake Wang, Jinping Chen, Yi Zeng, Tianjun Yu, Xudong Guo, Shuangqing Wang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci, Jun Zhao, Shumin Yang, Yanqing Wu, Guoqiang Yang, Yi Li
Abstract
-Boc protecting ratio and the patterning ability and supply useful guidelines for designing molecular resists.
Topics & Concepts
ResistExtreme ultraviolet lithographyMaterials scienceLithographyElectron-beam lithographyNanotechnologyX-ray lithographyOptoelectronicsLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesAdvanced Surface Polishing Techniques