Substrate Temperature Dependence of TiO2 Films Deposited by Spray Ultrasonic Nebulizer Technique
Mohammed K. Khalaf, Firdous Shaker Ahmed, Ruaa M. Saleh Al-alWany
Abstract
This work details the growth of nanostructured TiO2 thin films on a glass substrates using the ultrasonic nebulizer technique, deposited at 300-600 °C . The influence of the deposition temperature is linked to the physic-chemical properties of the TiO2 thin films. XRD- results confirmed that the nanostructures tetragonal are polycrystalline, the grain size(s) increases alongside the substrates temperature, and the deposited film is the anatase phase at 400 ̊C. The surface morphology of the deposited film were imaged using the (AFM) technique, and it was confirmed that the films are of excellent crystallinity and are homogeneously dispersed. It was also confirmed that the Root Mean Square (RMS) of the thin films' surface roughness is dictated by the substrate's temperature, which was further confirmed using the SEM technique. The substrate temperature is inversely proportional to the optical energy gap values. The increase in optical gap with increasing substrate temperature can be due to improvement in the films crystallinity .At higher temperatures promote a high mobility of ad-atoms; it allows a better atomic arrangement, which promotes the formation of a crystalline structure.