Litcius/Paper detail

Field Ion Emission in an Atom Probe Microscope Triggered by Femtosecond-Pulsed Coherent Extreme Ultraviolet Light

Ann N. Chiaramonti, Luis Miaja‐Avila, Benjamin W. Caplins, Paul T. Blanchard, David R. Diercks, Brian P. Gorman, Norman A. Sanford

2020Microscopy and Microanalysis24 citationsDOI

Abstract

This paper describes initial experimental results from an extreme ultraviolet (EUV) radiation-pulsed atom probe microscope. Femtosecond-pulsed coherent EUV radiation of 29.6 nm wavelength (41.85 eV photon energy), obtained through high harmonic generation in an Ar-filled hollow capillary waveguide, successfully triggered controlled field ion emission from the apex of amorphous SiO2 specimens. The calculated composition is stoichiometric within the error of the measurement and effectively invariant of the specimen base temperature in the range of 25 K to 150 K. Photon energies available in the EUV band are significantly higher than those currently used in the state-of-the-art near-ultraviolet laser-pulsed atom probe, which enables the possibility of additional ionization and desorption pathways. Pulsed coherent EUV light is a new and potential alternative to near-ultraviolet radiation for atom probe tomography.

Topics & Concepts

Extreme ultraviolet lithographyExtreme ultravioletMaterials scienceFemtosecondField ion microscopeOpticsUltravioletMicroscopePhoton energyAtomic physicsIonIonizationLaserOptoelectronicsPhotonChemistryPhysicsOrganic chemistryAdvanced Materials Characterization TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications