The interstitial diffusion behaviors and mechanisms of boron in α-Ti and β-Ti: A first-principles calculation
Yonghua Duan, Ying Wu, Mingjun Peng, Huarong Qi
Topics & Concepts
DiffusionBoronDiffusion barrierBorideOctahedronMaterials scienceInterstitial defectAtom (system on chip)Effective diffusion coefficientCrystallographyChemistryLayer (electronics)ThermodynamicsMetallurgyCrystal structureDopingNanotechnologyMagnetic resonance imagingOptoelectronicsPhysicsOrganic chemistryEmbedded systemComputer scienceMedicineRadiologyMetal and Thin Film MechanicsFusion materials and technologiesTitanium Alloys Microstructure and Properties