A design of green slurry for copper/cobalt barrier-step chemical mechanical polishing with controlled removal selectivity and dynamic galvanic corrosion inhibition
Pengfei Chang, Zisheng Huang, Huiqin Ling, Yunwen Wu, Ming Li, Tao Hang
Topics & Concepts
Materials scienceCopperSlurryChemical-mechanical planarizationGalvanic cellPolishingMetallurgyCobaltCorrosionGalvanic corrosionSelectivityChemical engineeringComposite materialOrganic chemistryChemistryEngineeringCatalysisAdvanced Surface Polishing TechniquesAdvanced Machining and Optimization TechniquesAdvanced materials and composites