Implementation of Band Gap and Gate Oxide Engineering to Improve the Electrical Performance of SiGe/InAs Charged Plasma-Based Junctionless-TFET
Kaushal Kumar, Ajay Kumar, Varun Mishra, S. C. Sharma
Topics & Concepts
Materials scienceOxideBand gapOptoelectronicsPlasmaIonQuantum tunnellingConduction bandGrapheneTransistorTunnel field-effect transistorSemiconductorField-effect transistorNanotechnologyElectrical engineeringVoltageElectronPhysicsMetallurgyQuantum mechanicsEngineeringSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance Devices