Chemical vapor deposition for few‐layer two‐dimensional materials
Qing Zhang, Dechao Geng, Wenping Hu
Abstract
Abstract Chemical vapor deposition (CVD) approach offers a controllable strategy for preparing large‐area and high‐quality few‐layer (mainly bilayer or trilayer) twisted or untwisted two‐dimensional (2D) materials, and is predicted to boost the development of 2D materials from laboratory research to industrial applications.
Topics & Concepts
Chemical vapor depositionLayer (electronics)BilayerMaterials scienceDeposition (geology)NanotechnologyLayer by layerEngineering physicsChemical engineeringChemistryEngineeringGeologyMembraneSedimentPaleontologyBiochemistry2D Materials and ApplicationsGraphene research and applicationsGa2O3 and related materials