Tailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation study
Muyoung Kim, Sungwoo Park, Joonmyung Choi, Junghwan Moon, Maenghyo Cho
Topics & Concepts
Materials sciencePhotoresistExtreme ultraviolet lithographyLithographyResistMicrostructurePolymerComposite materialNanoscopic scalePhotolithographySurface finishNanotechnologyOptoelectronicsLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis