Whole Metal Oxide p-i-n Deep Ultraviolet Light-Emitting Diodes Using i-Ga₂O₃ Active Emissive Film
Hsin-Ying Lee, Chih‐Hsun Lin, Ching-Ting Lee
Abstract
In this work, whole transparent p-NiO/i-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /n-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> :Si deep ultraviolet light-emitting diodes (DUV-LEDs) were fabricated and studied. The p-NiO film was deposited using a radio frequency magnetron sputtering system. The i-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> film and the n-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> :Si film were deposited using a vapor cooling condensation system at about 80 K and then annealed in an oxygen ambience at 900 °C for 60 minutes. Due to the significantly reduced oxygen vacancies and intrinsic defects resided in the i-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> active emissive film, UV-C LEDs were obtained. By measuring the electroluminescence spectrum of the p-i-n DUV-LEDs, the peak wavelength of 240.0 nm and the half width at half maximum of 20.2 nm were obtained.