Litcius/Paper detail

Aluminum-ion-intercalation nickel oxide thin films for high-performance electrochromic energy storage devices

Hongliang Zhang, Sheng Liu, Tao Xu, Weiping Xie, Guoxin Chen, Lingyan Liang, Junhua Gao, Hongtao Cao

2021Journal of Materials Chemistry C37 citationsDOI

Abstract

Unleashing the true merits of aluminum-ion-intercalation nickel oxide thin films for EESDs by taking a closer look at the optical modulation, energy storage, and diffusion and reaction kinetics of the NiO/Al 3+ system.

Topics & Concepts

ElectrochromismMaterials scienceIntercalation (chemistry)Nickel oxideNon-blocking I/OThin filmNickelEnergy storageOxideIonChemical engineeringOptoelectronicsInorganic chemistryElectrodeNanotechnologyMetallurgyCatalysisPhysical chemistryEngineeringBiochemistryChemistryPower (physics)Quantum mechanicsPhysicsTransition Metal Oxide NanomaterialsZnO doping and propertiesSemiconductor materials and devices
Aluminum-ion-intercalation nickel oxide thin films for high-performance electrochromic energy storage devices | Litcius