Novel photoelectrochemically combined mechanical polishing technology for scratch-free 4H-SiC surface by using CeO2-TiO2 composite photocatalysts and PS/CeO2 core/shell abrasives
Bo Gao, Wenjie Zhai, Quan Zhai, Chang Wang
Topics & Concepts
PolishingMaterials sciencePhotocatalysisComposite numberScratchSurface roughnessComposite materialPolystyreneSemiconductorLayer (electronics)AnodeChemical engineeringOptoelectronicsCatalysisChemistryElectrodeBiochemistryPolymerEngineeringPhysical chemistryAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchSemiconductor materials and devices