Material removal at atomic and close-to-atomic scale by high-energy photon: a case study using atomistic-continuum method
Haojie An, Jinshi Wang, Fengzhou Fang
Topics & Concepts
PhotoionizationExtreme ultraviolet lithographyExtreme ultravioletPhotonAtomic physicsAtomic unitsMonocrystalline siliconMaterials scienceFemtosecondAtom (system on chip)SiliconDesorptionPhoton energySemiconductorMolecular physicsChemistryNanotechnologyLaserPhysicsOptoelectronicsOpticsIonizationIonPhysical chemistryOrganic chemistryQuantum mechanicsEmbedded systemAdsorptionComputer scienceLaser Material Processing TechniquesIon-surface interactions and analysisAdvanced Surface Polishing Techniques