Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography
Olha Sysova, Paule Durin, Corinne Gablin, Didier Léonard, Alexandre Téolis, Stéphane Trombotto, Thierry Delair, Dominique Berling, Isabelle Servin, Raluca Tiron, Arnaud Bazin, Jean-Louis Leclercq, Yann Chevolot, Olivier Soppera
Abstract
International audience
Topics & Concepts
PhotoresistMicroelectronicsChitosanPhotolithographyMaterials scienceContext (archaeology)NanotechnologyEtching (microfabrication)Aqueous solutionCoatingChemical engineeringChemistryLayer (electronics)Organic chemistryEngineeringBiologyPaleontologyConducting polymers and applicationsElectrowetting and Microfluidic TechnologiesAnalytical Chemistry and Sensors