Highly Efficient Photocatalytic Elimination of Bacteria and Antibiotic Resistance Genes via a Strong Oxidation Surface in Donor‐Acceptor SA‐PDI@C <sub>60</sub>
Wenting Li, Wenlu Li, Xiaolin Zhu, Yizhou Yan, Haoying Wang, Wenhao Shi, Jun Yang, Yongfa Zhu, Lijuan Li, Jinhan Sheng, Ming Wang, Yongfa Zhu
Abstract
Abstract The elimination of antibiotic‐resistant bacteria (ARB) and their antibiotic resistance genes (ARGs) requires photocatalysts with strong oxidative surfaces and efficient charge separation under natural light. Herein, a novel donor‐acceptor (D‐A) supramolecular photocatalyst, SA‐PDI@C 60 , is reported for natural light‐driven antibacterial application. The D‐A structure of SA‐PDI@C 60 amplifies the interfacial electric field (IEF) (≈1.96 times) and promotes efficient carrier separation and migration along π–π stacked pathways, leading to the accumulation of holes at the catalyst surface. This generates a highly oxidative antibacterial interface enriched in multiple reactive oxygen species. As a result, SA‐PDI@C 60 achieves 100% inactivation of Escherichia coli , Staphylococcus aureus , and ARB within 2 h under sunlight, accompanied by irreversible ARG degradation within 4 h, thereby preventing horizontal gene transfer. Proteomic analyses reveal that ROS‐induced oxidative stress disrupted DNA replication, aerobic respiration, and energy metabolism, ultimately causing bacterial death. This study demonstrates a D‐A photocatalyst with a highly active surface and effective IEF‐driven charge separation, offering a promising strategy for photocatalytic antibacterial action and ARG elimination under natural light.