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Band gap and gate underlap engineered novel Si0.2Ge0.8/GaAs JLTFET with dual dielectric gate for improved wireless applications

Kaushal Kumar, Ajay Kumar, Vinay Kumar, S. C. Sharma

2023AEU - International Journal of Electronics and Communications20 citationsDOI

Topics & Concepts

Ambipolar diffusionTransconductanceMaterials scienceDielectricOptoelectronicsGate dielectricIonBand gapElectrical engineeringPlasmaTransistorPhysicsEngineeringVoltageQuantum mechanicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance Devices
Band gap and gate underlap engineered novel Si0.2Ge0.8/GaAs JLTFET with dual dielectric gate for improved wireless applications | Litcius