Selective atomic layer etching of Al2O3, AlNx and HfO2 in conventional ICP etching tool
Vitaly Kuzmenko, Yury Lebedinskij, Andrey Miakonkikh, K. V. Rudenko
Topics & Concepts
Etching (microfabrication)Reactive-ion etchingAtomic layer depositionPlasma etchingMaterials scienceDry etchingAnalytical Chemistry (journal)TinLayer (electronics)Deposition (geology)Surface modificationChemistryNanotechnologyMetallurgyChromatographyPhysical chemistrySedimentBiologyPaleontologySemiconductor materials and devicesPlasma Diagnostics and ApplicationsMetal and Thin Film Mechanics