High-Mobility Tellurium Thin-Film Transistor: Oxygen Scavenger Effect Induced by a Metal-Capping Layer
Seung-Min Lee, Seong Cheol Jang, Jimin Park, Jaewon Park, Nayoung Choi, Kwun‐Bum Chung, Jung Woo Lee, Hyun‐Suk Kim
Abstract
With the ongoing development of electronic devices, there is an increasing demand for new semiconductors beyond traditional silicon. A key element in electronic circuits, complementary metal-oxide semiconductor (CMOS), utilizes both n-type and p-type semiconductors. While the advancements in n-type semiconductors have been substantial, the development of high-mobility p-type semiconductors has lagged behind. Recently, tellurium (Te) has been recognized as a promising candidate due to its superior electrical properties and the capability for large-area deposition via vacuum processes. In this work, an innovative approach involving the addition of a metal-capping layer onto Te thin-film transistors (TFTs) is proposed, which significantly enhances their electrical characteristics. In particular, the application of an indium (In) metal-capping layer has led to a dramatic increase in the field-effect mobility of Te TFTs from 2.68 to 33.54 cm2/Vs. This improvement is primarily due to the oxygen scavenger effect, which effectively minimizes oxidation and eliminates oxygen from the Te layer, resulting in the production of high-quality Te thin films. This progress in high-mobility p-type semiconductors is promising for the advancement of high-performance electronic devices in various applications and industries.