Magnetic characteristics of epitaxial NiO films studied by Raman spectroscopy
J. Feldl, M. Budde, C. Tschammer, O. Bierwagen, M. Ramsteiner
Abstract
Raman spectroscopy is utilized to study the magnetic characteristics of heteroepitaxial NiO thin films grown by plasma-assisted molecular beam epitaxy on MgO(100) substrates. For the determination of the Néel temperature, we demonstrate a reliable approach by analyzing the temperature dependence of the Raman peak originating from second-order scattering by magnons. The antiferromagnetic coupling strength is found to be strongly influenced by the growth conditions. The low-temperature magnon frequency and the Néel temperature are demonstrated to depend on the biaxial lattice strain and the degree of structural disorder, which is dominated by point defects.
Topics & Concepts
Materials scienceRaman spectroscopyAntiferromagnetismMolecular beam epitaxyRaman scatteringCondensed matter physicsNon-blocking I/OEpitaxySpectroscopyMagnonThin filmLattice (music)ScatteringCoupling (piping)Analytical Chemistry (journal)FerromagnetismLattice constantCrystallographic defectCoherent anti-Stokes Raman spectroscopyNéel temperatureNuclear magnetic resonanceMagnetizationMagnetic semiconductorTransition Metal Oxide NanomaterialsZnO doping and propertiesMagnetic properties of thin films