Litcius/Paper detail

Influence of material and process parameters in the dry-development of positive-tone, polyaldehyde photoresist

Anthony Engler, Cassidy Tobin, Chi Kin Lo, Paul A. Kohl

2020Journal of materials research/Pratt's guide to venture capital sources12 citationsDOI

Topics & Concepts

Materials sciencePhotoresistTone (literature)Process (computing)Process developmentProcess engineeringComposite materialComputer scienceLayer (electronics)LiteratureArtEngineeringOperating systemAdvancements in Photolithography TechniquesNanofabrication and Lithography TechniquesInjection Molding Process and Properties
Influence of material and process parameters in the dry-development of positive-tone, polyaldehyde photoresist | Litcius