Ultralow dielectric constant SiCOH films by plasma enhanced chemical vapor deposition of decamethylcyclopentasiloxane and tetrakis(trimethylsilyloxy)silane precursors
Yoon‐Soo Park, Hyuna Lim, Sungyool Kwon, Wonjin Ban, Seonhee Jang, Donggeun Jung
Topics & Concepts
Chemical vapor depositionSilaneX-ray photoelectron spectroscopyDielectricAnalytical Chemistry (journal)Fourier transform infrared spectroscopyMaterials sciencePlasma-enhanced chemical vapor depositionChemistryChemical engineeringComposite materialNanotechnologyOrganic chemistryOptoelectronicsEngineeringCopper Interconnects and ReliabilitySemiconductor materials and devicesMetal and Thin Film Mechanics