Influence of Topological Confinement on Nanoscale Film Morphologies of Tricyclic Block Copolymers
Brian J. Ree, Yusuke Satoh, Takuya Isono, Toshifumi Satoh
Abstract
This study is the first quantitative synchrotron grazing incidence X-ray scattering investigation of nanoscale film morphologies of tricyclic block copolymers based on poly(n-decyl glycidyl ether) (PDGE) and poly(2-(2-(2-methoxyethoxy)ethoxy)ethyl glycidyl ether) (PTEGGE) blocks in equivalent volume fractions. Both PDGE and PTEGGE blocks of the tricyclic block copolymers are amorphous, but copolymers exhibit phase-separated lamellar nanostructures due to block immiscibility. The lamellar structures vary in their structural parameters such as lamellar orientation and structural integrity stability depending on the degree of topological confinement effect taking effect. Interestingly, sub-10 nm domain spacings are established by all nanostructures, which are remarkably shorter than that of the linear analogue. These exceptionally short domain spacings are evident that the tricyclic block copolymer approach is highly efficient for developing high-performance nanolithographic materials for future advanced semiconductor applications.