The effect of oxygen flow rate on metal–insulator transition (MIT) characteristics of vanadium dioxide (VO2) thin films by pulsed laser deposition (PLD)
Syed A. Bukhari, Sooraj Kumar, Pawan Kumar, Sarang P. Gumfekar, Hyun‐Joong Chung, Thomas Thundat, Ankur Goswami
Topics & Concepts
Thin filmPulsed laser depositionMaterials scienceMetal–insulator transitionAnalytical Chemistry (journal)OxygenVolumetric flow rateElectrical resistivity and conductivityVanadium oxidePartial pressureSubstrate (aquarium)VanadiumMetalNanotechnologyChemistryMetallurgyThermodynamicsElectrical engineeringOrganic chemistryChromatographyPhysicsGeologyEngineeringOceanographyTransition Metal Oxide NanomaterialsAdvanced Memory and Neural ComputingGa2O3 and related materials