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Dipole engineering at HfO2/SiO2 interface by ultra-thin Al2O3 to modulate flat-band voltage for cryogenic temperatures

Ziqiang Huang, Tao Liu, Lewen Qian, Xinlong Guo, Meicheng Liao, Meng Wang, Saisheng Xu, Saisheng Xu, Chen Wang, Min Xu, David Wei Zhang, Min Xu, David Wei Zhang

2025Vacuum7 citationsDOI

Topics & Concepts

DipoleMaterials scienceInterface (matter)OptoelectronicsVoltageEngineering physicsNanotechnologyElectrical engineeringChemistryComposite materialPhysicsEngineeringCapillary numberCapillary actionOrganic chemistrySemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure AnalysisAdvancements in Semiconductor Devices and Circuit Design
Dipole engineering at HfO2/SiO2 interface by ultra-thin Al2O3 to modulate flat-band voltage for cryogenic temperatures | Litcius