Solvent-free bottom-up patterning of zeolitic imidazolate frameworks
Yurun Miao, Dennis T. Lee, Matheus Dorneles de Mello, Mueed Ahmad, Mohammed K. Abdel‐Rahman, Patrick M. Eckhert, J. Anibal Boscoboinik, D. Howard Fairbrother, Michael Tsapatsis
Abstract
Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.