An aluminum-based hybrid film photoresist for advanced lithography by molecular layer deposition
Xingkun Wang, Taoli Guo, Yiyang Shan, Ou Zhang, Hong Dong, Jincheng Liu, Feng Luo
Abstract
Al-based dry photoresists synthesized by molecular layer deposition (MLD) have good resolution and excellent etch resistance, so their application in photolithography is very promising.
Topics & Concepts
Materials sciencePhotoresistLayer (electronics)LithographyDeposition (geology)AluminiumNanotechnologyAtomic layer depositionOptoelectronicsComposite materialBiologySedimentPaleontologySemiconductor materials and devicesAdvancements in Photolithography TechniquesCopper Interconnects and Reliability